Novaurum's technologies
Atomic Layer Deposition
Atomic Layer Deposition (or ALD) is a thin-film deposition technique that allows for precise, atomic-scale control of material layers. It involves sequential, self-limiting chemical reactions to deposit ultra-thin, uniform coatings with exceptional conformality, even on complex 3D surfaces.
Key Benefits of ALD
Atomic scale precision
Atomic scale precision
Atomic scale precision
ALD ensures coatings are uniform and defect-free, with thicknesses controlled at the nanometer level, enhancing device reliability.
Superior conformity
Atomic scale precision
Atomic scale precision
ALD coats intricate geometries and high-aspect-ratio structures, ensuring consistent performance across complex implant designs.
Biocompatibility
Atomic scale precision
Functional versatility
Materials used in ALD, such as titanium dioxide, are biocompatible and safe for long-term implantation, reducing risks of adverse reactions.
Functional versatility
Functional versatility
Functional versatility
ALD enables the creation of specialized coatings, including antimicrobial, corrosion-resistant, or drug-eluting layers, to meet diverse clinical needs.
Durability
Functional versatility
Scalability
ALD coatings are highly resistant to wear, corrosion, and degradation, extending the lifespan of medical devices.
Scalability
Functional versatility
Scalability
ALD processes are compatible with high-volume manufacturing, offering cost-effective solutions for large-scale production.